| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a930137dbfa8ded0a0151271e7d68bbc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_afd92fd42903f4a5db6134090b0b8958 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2011-07-06^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e05190df21cb59fae778c28dad2dd029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c6516d60bdc4110a829230f95b11f2f |
| publicationDate |
2012-01-12^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2012009520-A1 |
| titleOfInvention |
Positive resist composition and method of forming resist pattern |
| abstract |
A positive resist composition including a resin component (A1) having a structural unit (a1) derived from an acrylate ester which may have an atom other than hydrogen or a group bonded to the carbon atom on the α position and containing an acid dissociable, dissolution inhibiting group, and a structural unit (a0) containing an —SO 2 — containing cyclic group; a compound (C1) represented by general formula (c1) shown below; and an acid-generator component (B) which generates acid upon exposure, wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Y 1 represents a divalent aliphatic hydrocarbon group; R 1 represents a hydrogen atom, a fluorine atom, an alkyl group or a fluorinated alkyl group; p represents an integer of 1 to 10; and A + represents an organic cation. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8614049-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012148956-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9040224-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014272727-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9494860-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9469712-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9005872-B2 |
| priorityDate |
2010-07-08^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |