| abstract |
A variable data lithography system includes an improved imaging member, a dampening solution subsystem, a patterning subsystem, an inking subsystem, and an image transfer subsystem. The imaging member comprises a reimageable surface layer comprising a polymer, the reimageable surface having a surface roughness Ra in the range of 0.10-4.0 μm peak-to-valley, and peak-to-valley nearest neighbor average distances finer than 20 μm. A structural mounting layer may be provided to which the reimageable surface layer is attached, either directly or with intermediate layers therebetween. The relatively rough surface facilitates retention of dampening solution and improves inking uniformity and transfer. The reimageable surface layer may be comprised of polydimethylsiloxane (silicone), and may optionally have particulate radiation sensitive material disbursed therein to promote absorption, and hence heating, from an optical source. |