| abstract |
Provided is a curable composition for imprints which ensures satisfactory pattern formability and defect-preventive performance even in the process of high-speed pattern transfer. The curable composition for imprints, comprises at least one species of polymerizable monomer(s) (A), and a photo-polymerization initiator (B), wherein the polymerizable monomer (A) contains a polymerizable monomer (Ax) having a hydrogen-bondable group and fluorine-containing group(s). |