http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012276679-A1

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0d0ca0642e6b5a548a018a505db8279e
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14643
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14689
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0232
filingDate 2012-07-02^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ee52eae06a1599c1c0ef09119010d6d
publicationDate 2012-11-01^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2012276679-A1
titleOfInvention Method of making a CMOS image sensor and method of suppressing dark leakage and crosstalk for a CMOS image sensor
abstract A CMOS image sensor, in which an implantation process is performed on substrate under isolation structures each disposed between two adjacent photosensor cell structures. The implantation process is a destructive implantation to form lattice effects/trap centers. No defect repair process is carried out after the implantation process is performed. The implants can reside at the isolation structures or in the substrate under the isolation structures. Dark leakage and crosstalk are thus suppressed.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9942461-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11375100-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104867950-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10813630-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10842626-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10159571-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10314594-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10979621-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9566443-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10307167-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10382666-B2
priorityDate 2008-08-12^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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