| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0dc802303cc670856ffcb7d8ca265499
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c33a7b44cc698b3b8e3b6ff9962036f5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_71dbea525057b1c78dee2e24cd57c83e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d13e1cc15b16400f48f4a2011618fa6f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fd4bb5f1dc3b1a87629835b26ac89ef1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_91cdbd16ec7de3b8bbe059826481807c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_063a1b324005ddc15e16e7529c6258c4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c877b896b10761870db2efadead8bf72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_acc9baa7cdd7196b55eb9d3504b5095f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-1804
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K85-624
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K85-791 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-18 |
| filingDate |
2010-11-18^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b6822963b9ffa2e61fc62f64c7fd7ff4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c5ba1e8d4e27ca8a49ad793cb577093
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b72b80f9f6e51792edef1a2a82354ff0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3fbfe8fbc6e7f10057116750c3bed565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5db15396d1370f0c316c7d96164b69c7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d996e34b152390781a7fe267946d115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43ed12f496c96e6a1e1392e0a91d9457
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_beb244e4342999afaf535c0b4dbed4e1 |
| publicationDate |
2012-12-27^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2012330047-A1 |
| titleOfInvention |
Compound |
| abstract |
A problem of the present invention is to prevent a base layer beneath the layer to be irradiated with light from deterioration in property and a functional thin film from deterioration in property as the fine patterning of a functional film is performed with light irradiation. Means for solving the problem is a compound obtained by dimerizing with light irradiation a compound (A) containing a group that has photosensitivity and can be photodimerized and a group having lyophilicity and a compound (B) containing a group that has photosensitivity and can be photodimerized and a group having liquid-repellency. |
| priorityDate |
2009-11-18^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |