| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7aa689e04815be2ac40ed8c5d20d9aba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2e0a5e2fe9dd5e8486bdc3d941efd80a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05D23-27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06K9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-035 |
| filingDate |
2012-07-06^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_81d91df86fa3ef6baf53a174f6363b2c |
| publicationDate |
2013-01-17^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2013017139-A1 |
| titleOfInvention |
Methods and Systems For Monitoring and Controlling Silicon Rod Temperature |
| abstract |
Systems and methods are disclosed for monitoring and controlling silicon rod temperature. One example is a method of monitoring a surface temperature of at least one silicon rod in a chemical vapor deposition (CVD) reactor during a CVD process. The method includes capturing an image of an interior of the CVD reactor. The image includes a silicon rod. The image is scanned to identify a left edge of the silicon rod and a right edge of the silicon rod. A target area is identified midway between the left edge and the right edge. A temperature of the silicon rod in the target area is determined. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021505880-A |
| priorityDate |
2011-07-13^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |