http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013156950-A1

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filingDate 2012-12-13^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2013-06-20^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2013156950-A1
titleOfInvention Film-forming apparatus and film-forming method
abstract A film-forming apparatus 1 includes a reaction chamber 2 , an exhaust mechanism 3 , and a pipe 4 connecting them. An inert gas supply pipe 11 supplying an inert gas 15 in the pipe 4 , and a trap section 5 ′ connecting with an exhaust pipe 16 exhausting a reaction product 14 are provided in the pipe 4 . A substrate is disposed in the reaction chamber 2 and film formation is performed on the substrate by supplying a reaction gas 7 from a reaction gas supply pipe 8 . The reaction product 14 is collected in the trap section 5 ′. An inert gas 15 is supplied to the trap section 5 ′ to pressure-feed the reaction product 14 from the exhaust pipe 16 to a detoxifying apparatus 20 . Cleaning is performed by supplying a cleaning gas 21 to the reaction chamber 2 and exhausting the same while bypassing the trap section 5.
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