http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014191354-A1

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filingDate 2014-03-13^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2014-07-10^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2014191354-A1
titleOfInvention Laser system with polarized oblique incidence angle and associated methods
abstract Novel laser processed semiconductor materials, systems, and methods associated with the manufacture and use of such materials are provided. In one aspect, for example, a method of processing a semiconductor material can include providing a semiconductor material and irradiating a target region of the semiconductor material with a beam of laser radiation to form a laser treated region. The laser radiation is irradiated at an angle of incidence relative to the semiconductor material surface normal of from about 5° to about 89°, and the laser radiation can be at least substantially p-polarized.
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priorityDate 2011-09-30^^<http://www.w3.org/2001/XMLSchema#date>
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