http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015044858-A1

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filingDate 2014-08-04^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_358eb94eb84d648f1ad23ad0ffc95ebf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d83fb7146e435aaa237f3b002482886
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publicationDate 2015-02-12^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2015044858-A1
titleOfInvention Film-forming material
abstract A film-forming material including a metal oxide such as a SiO 2 film on the surface of a substrate, in which foreign substances, such as fine particles, are generated with difficulty while being stored, and a method for forming a film, in which the method includes forming a film on the surface of a substrate using the film-forming material. The film-forming material includes a metal compound capable of generating a hydroxyl group upon hydrolysis dissolved in an organic solvent that does not have a functional group that reacts with the metal compound. The organic solvent includes a solvent having a value of Log P of from 0 to 3.5.
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