| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate |
2013-09-30^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c7df139bb8b8a4400ab8cda5a63fb4a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56671bd4995cd031f3314280c885e2d1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb61b9779224e610d893341260a717b1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f07ea293e839a9b383f4cec85d6582d3 |
| publicationDate |
2015-11-05^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2015315418-A1 |
| titleOfInvention |
Polishing composition |
| abstract |
[Problem] Provided is a polishing composition that can sufficiently maintain a high polishing rate for a barrier layer and an insulating film and suppress the occurrence of a surface defect such as erosion or fang. n [Solution] Provided is a polishing composition which is used in the application to polish a polishing object having a barrier layer, a metal wiring layer and an insulating film, the polishing composition including abrasive grains, an oxidant, a metal corrosion inhibitor, a pH adjusting agent and water, in which an aspect ratio of abrasive grains is 1.22 or less and a ratio D90/D10 of a diameter D90 of particles when a cumulative particle weight from the fine particle side reaches 90% of the total particle weight to a diameter D10 of particles when the cumulative particle weight from the fine particle side reaches 10% of the total particle weight of the entire particles is 1.5 or more in a particle size distribution of the abrasive grains determined by a laser diffraction scattering method. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017247574-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019112505-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10703936-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115141549-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10190024-B2 |
| priorityDate |
2012-11-02^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |