http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016199940-A1

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filingDate 2016-03-25^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2016-07-14^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2016199940-A1
titleOfInvention Laser processing apparatus
abstract A laser processing apparatus includes a plasma detecting unit for detecting a wavelength of plasma light generated by applying a pulsed laser beam from a laser beam applying unit to a workpiece. The plasma detecting unit includes a bandpass filter for passing only the wavelength of plasma light generated from a first material and a photodetector for detecting the light passed through the bandpass filter. A light intensity signal is output to a controller. The controller controls the laser beam applying unit so that the amplitude of a light intensity is detected according to the light intensity signal output from the photodetector. The pulsed laser beam is stopped after the amplitude of the light intensity is decreased to a predetermined value and a predetermined number of shots of the pulsed laser beam has been applied.
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