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publicationDate 2016-07-28^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2016218217-A1
titleOfInvention Semiconductor device including fin structure with two channel layers and manufacturing method thereof
abstract A semiconductor device includes a fin structure protruding from a substrate and having a top face and a first side face and a second side face opposite to the first side face, and first semiconductor layers disposed over the first and second side faces of the fin structure. A thickness in a vertical direction of the first semiconductor layers is smaller than a height of the fin structure.
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