| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-80 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-188
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G79-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-184
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-1836
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-1804 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G79-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-18 |
| filingDate |
2015-12-28^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4f04400920727cf56f01b5702ae1a91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94be320ab77e8e1113b2306ca0a89a14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c7c43a1ce167de3105aa32bb80076a9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90276c3fc7ed227be052968bb970bcd8 |
| publicationDate |
2016-08-11^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2016229960-A1 |
| titleOfInvention |
Fluorine-containing silicon compound, method for producing same, and method for producing fluorine-containing silicon resin |
| abstract |
The present invention provides a fluorine-containing silicon compound represented by the general formula (1), n n n n n n n n n n wherein each R 1 independently represents a hydrocarbon group having 1 to 6 carbon atoms; each R 2 independently represents a hydrogen atom or a hydrocarbon group having 1 to 6 carbon atoms; and n is an integer satisfying 0≦n≦2. There can be provided a fluorine-containing silicon compound having good storage stability and useful as a raw material of a composition for forming a silicon-containing intermediate film and a silicon-containing photoresist composition used for a fine processing in the manufacturing process of a semiconductor device. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018248224-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018160602-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10879564-B2 |
| priorityDate |
2015-02-06^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |