http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017362709-A1

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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78af061ab1d8eaba2a7f146e4a967d3d
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publicationDate 2017-12-21^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2017362709-A1
titleOfInvention Ald of metal-containing films using cyclopentadienyl compounds
abstract Atomic layer deposition (ALD) type processes for producing metal containing thin films comprise feeding into a reaction space vapor phase pulses of metal containing cyclopentadienyl precursors as a metal source material. In preferred embodiments the metal containing cyclopentadienyl reactant comprises a metal atom that is not directly bonded to an oxygen or halide atom. In other embodiments the metal atom is bonded to a cyclopentadienyl compound and separately bonded to at least one ligand via a nitrogen atom. In still other embodiments the metal containing cyclopentadienyl compound comprises a nitrogen-bridged ligand.
priorityDate 2006-10-27^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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