http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018088458-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0b8162e700269437c1154fb100e8de7d |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133516 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133512 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-201 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133516 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133512 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095 |
| filingDate | 2016-04-14^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca4a6e6fd54c36cebae48a835ef1a490 |
| publicationDate | 2018-03-29^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2018088458-A1 |
| titleOfInvention | Color filter substrate manufacturing method and color filter substrate manufactured with same |
| abstract | The present invention provides a CF substrate manufacturing method and a CF substrate manufactured with the method. Through sequentially forming first, second, and third photoresist layers on the base plate and individually subjecting the first, second, and third photoresist layers to patterning, first, second, and third photoresist matrices that are stacked on each other, a plurality of first photoresist blocks, a plurality of second photoresist blocks, and a plurality of third photoresist blocks are formed such that the first, second, and third photoresist matrices have colors that are mixed to exhibit a color of black to thereby serve as a black matrix and the plurality of first photoresist blocks, the plurality of second photoresist blocks, and the plurality of third photoresist blocks are separated from each other by the black matrix and collectively form a color resist layer. The present invention features simultaneously forming a black matrix in manufacturing a color resist layer and, compared to the prior art, saves the time for separately manufacturing the black matrix, saves the material for the black matrix, and reduces the manufacturing cost. The CF substrate of the present invention has a simple structure, a low manufacturing cost, and excellent effect of filtration of light. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11269120-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11762137-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11257870-B2 |
| priorityDate | 2016-03-07^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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