http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018200861-A1

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filingDate 2016-05-18^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60493d6dbcf3cb991e1a852944069cca
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publicationDate 2018-07-19^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2018200861-A1
titleOfInvention Polishing pad and polishing method
abstract To provide a polishing pad capable of sufficiently polishing, in polishing of an object to be polished having at least one of a projection portion and a recessed portion on the surface, a portion near the projection portion or the inner surface of the recessed portion of the surface of the object to be polished. The polishing pad has a piloerection portion ( 1 ) in which a plurality of fibers ( 12 ) having a length of 2 mm or more are raised on the surface of a base ( 11 ), in which the mass of the fibers ( 12 ) is 250 g/m 2 or more. The polishing pad is used for polishing an object to be polished ( 2 ) containing metal, an alloy, or a metal oxide material and having at least one of a projection portion ( 21 ) and a recessed portion ( 22 ) on the surface.
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priorityDate 2015-07-17^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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