http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018339399-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c97f90ab12b35b650d5fd039ed7a41a5 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-04 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B57-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B57-02 |
| filingDate | 2016-12-01^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a231b8fe1055b7e9c8519b89dea75e17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7dbd18a3a6ade396e027b65648d92a53 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d793b4467b14fcef66dd94c9e90db60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88179b032ceced0973a253d7388a63d9 |
| publicationDate | 2018-11-29^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2018339399-A1 |
| titleOfInvention | Abrasive slurry regeneration method |
| abstract | An object of the present invention is to provide an abrasive slurry regeneration method capable of efficiently regenerating an abrasive slurry having a high polishing rate. The abrasive slurry regeneration method is an abrasive slurry regeneration method for polishing a polishing target containing silicon oxide as a main component using an abrasive slurry containing abrasive particles and a plurality of kinds of additives and then regenerating a collected abrasive slurry, characterized by including a regeneration step of collecting an additive having a molecular weight of 500 or more and an additive adsorbed by the abrasive particles among additives contained in the collected abrasive slurry together with the abrasive particles while an abrasive concentration (% by mass) is maintained within a range of 0.2 to 3000% with respect to an abrasive concentration (% by mass) of an unused abrasive slurry when being used for polishing a polishing target. |
| priorityDate | 2015-12-09^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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