Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d78fe473c8a29219129bbc8bb50f6a59 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J49-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-30 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J49-105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J49-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J49-0422 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J49-0431 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J49-049 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-623 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J49-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J49-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-30 |
filingDate |
2018-12-20^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f708c45b7e4ad8d27a4fe1460904c168 |
publicationDate |
2021-01-07^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2021005440-A1 |
titleOfInvention |
Sample analysis method and sample introduction device |
abstract |
A desolvation unit performs desolvation by heating after a sample solution is turned to sample mist by a nebulizer. A sample gas that contains the desolvated sample mist and a carrier gas is introduced through a sample introduction tube to a plasma torch. An addition unit for adding, to the sample introduction tube, a water-containing gas is provided. The addition unit includes a container that contains ultrapure water, a gas tube for introducing the carrier gas into the ultrapure water to cause bubbling, and a gas tube for adding the water-containing gas, to the sample introduction tube. The plasma torch generates an inductively coupled plasma under the condition that supplied power is set to a range of 550 W to 700 W. Generation of interfering molecule ions due to an element having a high ionization potential is inhibited when an element in a sample ionized by the plasma is analyzed. |
priorityDate |
2018-03-27^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |