http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021027975-A1

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filingDate 2020-09-29^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78f3a8f6dc6b04ddaa0bf281c577d189
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publicationDate 2021-01-28^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2021027975-A1
titleOfInvention Energy filter element for ion implantation systems for the use in the production of wafers
abstract The invention relates to an implantation device, an implantation system and a method. The implantation device includes a filter frame and a filter held by the filter frame, and a collimator structure. The filter is designed to be irradiated by an ion beam passing through the filter. The collimator structure is arranged on the filter, in the transmitted beam downstream of the filter, or on the target substrate.
priorityDate 2016-04-04^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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