| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32229
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05B6-6402 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05B6-806
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05B6-6402
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32192
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32201
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32284
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32247
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32229
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02252
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32311 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2019-09-05^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d16812e25bbc3b8cf007980f8d63640f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_646cdb735fab5f80b94350cd50c8a595
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d16a886f41c9ca9bf2e99d686a524cc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d234124be7e513dda348c4f8808368e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_193b315bb6d68a89d1cb99721b8abcf6 |
| publicationDate |
2021-03-11^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2021074539-A1 |
| titleOfInvention |
Methods and apparatus for dynamical control of radial uniformity with two-story microwave cavities |
| abstract |
Methods and apparatus provide plasma generation for semiconductor process chambers. In some embodiments, the plasma is generated by a system that may comprise a process chamber having at least two upper microwave cavities separated from a lower microwave cavity by a metallic plate with a plurality of radiation slots, at least one microwave input port connected to a first one of the at least two upper microwave cavities, at least two microwave input ports connected to a second one of the at least two upper microwave cavities, and the lower microwave cavity receives radiation through the plurality of radiation slots in the metallic plate from both of the at least two upper microwave cavities, the lower microwave cavity is configured to form an electric field that provides uniform plasma distribution in a process volume of the process chamber. |
| priorityDate |
2019-09-05^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |