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filingDate 1981-08-26^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1982-11-02^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b7bb333c05860b0a83d72f133246765
publicationDate 1982-11-02^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-4357416-A
titleOfInvention Process for preparation of multilayer photosensitive solvent-processable litho element
abstract An improved photosensitive litho element comprises, in order, a support, a non-photosensitive solvent-soluble contiguous layer having an optical density of at least 3.0 in the visible region of the spectrum and a maximum thickness of 0.015 mm, and a solvent-processable photosensitive layer. Dot-etchable contact litho negatives and positives are provided.
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