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filingDate 1983-05-19^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1985-04-09^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-4510222-A
titleOfInvention Photomask with corrected white defects
abstract A photomask with white defects that have corrected with a film comprising a mixture of silver and tantalum oxide. The film has a good resistance to chemicals.
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