| abstract |
Poly(aryl ether) resins having repeat units of the structure -O-E-O-E'- wherein E is the residuum of a dihydric phenol and E' is the residuum of a benzenoid compound having an inert electron withdrawing group in at least one of the positions ortho and para to the valence bonds, can be sulfonated by first reacting with a silyl halosulfonate, or the combination of a silyl halide and a halosulfonic acid, to form a resin having pendant silyl sulfonate groups, followed by the base cleavage of the silyl moiety to form the sulfonated resin. The sulfonated resins may be used to make membranes. |