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publicationDate 1988-05-03^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-4741988-A
titleOfInvention Patterned polyimide film, a photosensitive polyamide acid derivative and an electrophoretic image-display cell
abstract A method of manufacturing a polyimide pattern which is provided with a metal layer, such that a dual layer system is exposed in accordance with a certain pattern, which pattern contains a photosensitive polyamide acid derivative and a positive photoresist which is developed, provided with a metal layer and removed, after which, the polyamide acid derivative layer is developed and imidisied, as well as a new photosensitive polyamide acid derivative and an electrophoretic image-display cell.
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