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filingDate 1988-12-01^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1990-04-03^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5645a722bf33532d5a8b2873c6f835d
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publicationDate 1990-04-03^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-4914018-A
titleOfInvention Antistatic photographic base and light-sensitive element
abstract An improved antistatic base comprises a polymeric support film having coated thereon in sequence a first antistatic layer comprising a quaternary polyelectrolyte compound and a polymeric hydrophobic binder and a second protective layer comprising a polymeric hydrophobic binder, wherein said quaternary polyelectrolyte compound is a homopolymer or a copolymer of a diallyldialkylammonium salt compound. n The antistatic base is particularly useful as a support for light-sensitive silver halide photographic elements.
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priorityDate 1987-12-16^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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