patent/US-4949671-A

http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4949671-A

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Predicate	Object
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classificationCPCInventive	http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
classificationIPCInventive	http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
filingDate	1988-12-21^^<http://www.w3.org/2001/XMLSchema#date>
grantDate	1990-08-21^^<http://www.w3.org/2001/XMLSchema#date>
inventor	http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b41bf7408684d2c338dfd6f16d628ad0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3fa35177435f6ca88d00704d6b6c2a93 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab09860204a7324ed43234ee1e909d8a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23795840209adf53f5efb4218c687fc2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c578c42f67cd21e45a77c68aae5de8b1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_793ea4c8bbc799cce9be0e207e814e6a
publicationDate	1990-08-21^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	US-4949671-A
titleOfInvention	Processing apparatus and method
abstract	A processing apparatus and method wherein two separate gas feeds are provided in proximity to the face of a face down wafer. A shroud can be used to maximize mixing of the two gas feed streams without excessive residence time.
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