| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_137f12709e4d76352808b42ffc9adbe0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b5c5af219f4b0beb090dd5c4d34f413b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S505-73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S505-742
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S505-737 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-513
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4486
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-408
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N60-0492 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-513
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-448
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L39-24 |
| filingDate |
1991-01-11^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1992-03-31^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4377a1c01b0d7b2132924993508cd056
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_badefef9e8a891647db65640c6d22f71
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93fa92d619347e5eb07ddcccbe3d9e5a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60e08924681b4de345eb368049eddf66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb039e6aabb3002fa72c7d63b977b7d8 |
| publicationDate |
1992-03-31^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5100868-A |
| titleOfInvention |
Process for preparing superconducting films by radio-frequency-generated aerosol plasma deposition |
| abstract |
A two-step process for the preparation of a thallium-containing superconductive film is described. n In the first step of this process, an aerosol mist containing reactants necessary to produce a calcium/barium/strontium/copper precursor material is provided. This mist is subjected to radio-frequency radiation while in the plasma region, and it thereafter is deposited onto an electrically grounded substrate. n In the second step of the process, the coated substrate is contacted with thallium-containing vapor. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009294300-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005019551-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/AU-735872-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5894403-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005119725-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006118758-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5492885-A |
| priorityDate |
1990-04-17^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |