http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5166530-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f3bd08e138af739caaa2bb380cfc4070
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70916
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70983
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
filingDate 1991-12-20^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1992-11-24^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e98b5f2004e090e7c76d092deb4b52e5
publicationDate 1992-11-24^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-5166530-A
titleOfInvention Illuminator for microlithographic integrated circuit manufacture
abstract The illuminator apparatus disclosed herein provides illumination for the microlithographic manufacture of semiconductor integrated circuits. Degradation of the illuminator output by photopolymerization of volatile compounds associated with the resist coatings is inhibited by utilizing a composite filter at the cooling area inlet to the light source which includes a bed of activated carbon for removing volatile compounds which are photopolymerizable to substances which are absorbtive at the exposing wavelengths.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5833726-A
priorityDate 1991-12-20^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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