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publicationDate 1995-09-26^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-5453305-A
titleOfInvention Plasma reactor for processing substrates
abstract A plasma reactor and method for forming a dense plasma from a gas is described incorporating a housing, a gas inlet to the housing, a pump for evacuating the housing, a magnetic coil to generate a magnetic field in the housing, a radio frequency power supply, an electrode or induction coil in the housing, a microwave power supply. The invention overcomes the problem of an upper plasma density limit independent of increases in microwave power.
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