Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
filingDate |
1995-08-03^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
1997-07-15^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4ad9499fb9590800b0c39ddacca12db http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc5d713c1a9dfa7d53bf20ad93f186f1 |
publicationDate |
1997-07-15^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-5648194-A |
titleOfInvention |
Photoresist composition comprising an alkali-soluble resin, a quinone diazide compound and a vinyl ether |
abstract |
A photoresist composition comprising an alkali soluble resin, an o-naphthoquinone diazide sulfonic acid ester photoactive compound, and a vinyl ether compound. The o-naphthoquinone diazide sulfonic acid ester is replaced in part with the vinyl ether composition to decrease the concentration of the photoactive compound while increasing the photospeed of the composition. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5917024-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011086312-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5858605-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011042862-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8168109-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8168691-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007072109-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8632948-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010201043-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8455176-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010119972-A1 |
priorityDate |
1995-08-03^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |