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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
filingDate 1995-08-03^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1997-07-15^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4ad9499fb9590800b0c39ddacca12db
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc5d713c1a9dfa7d53bf20ad93f186f1
publicationDate 1997-07-15^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-5648194-A
titleOfInvention Photoresist composition comprising an alkali-soluble resin, a quinone diazide compound and a vinyl ether
abstract A photoresist composition comprising an alkali soluble resin, an o-naphthoquinone diazide sulfonic acid ester photoactive compound, and a vinyl ether compound. The o-naphthoquinone diazide sulfonic acid ester is replaced in part with the vinyl ether composition to decrease the concentration of the photoactive compound while increasing the photospeed of the composition.
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priorityDate 1995-08-03^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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