| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0387
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1071
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1067
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-0677
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C275-40 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C275-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-16 |
| filingDate |
1995-08-22^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1997-09-16^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5684c61a4af9fd6111997a81d0c2d62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20f6fd73333c52530dd0b90822965895
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf07ec9154cf94c81ccd75ca98901ca9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ef0cacd9d4c8c83934baf8653b0a6ee
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_560517ae58af2b9362dc3d75f8333ae2 |
| publicationDate |
1997-09-16^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5668248-A |
| titleOfInvention |
Photosensitive resin composition |
| abstract |
A photosensitive resin composition comprising, as its main ingredient, a poly(amic acid) resin constituted of a diamino compound represented by formula: <IMAGE> (I) and optionally used other diamino compound and a tetracarboxylic acid dianhydride as its constituent monomers and/or a poly(amic acid) ester resin obtained by esterifying said poly(amic acid) resin and/or a polyimide resin obtained by a dehydrating or alcohol-eliminating ring-closure reaction of said poly(amic acid) resin or poly(amic acid) ester resin has an excellent developability and a high film strength and can form a relief patter of low thermal expansion. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6077924-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5847071-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7368205-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006280881-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011172324-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005031994-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6329494-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1513014-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1513014-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6096850-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8722758-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009004597-A1 |
| priorityDate |
1992-01-20^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |