patent/US-5772862-A

http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5772862-A

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filingDate	1995-04-27^^<http://www.w3.org/2001/XMLSchema#date>
grantDate	1998-06-30^^<http://www.w3.org/2001/XMLSchema#date>
inventor	http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_16be2c2608b0b429dbf1657d5a7fb4bd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b428df59ca8c4c1b581b51a31c90416 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8b460bb4eed84446a6ed9bdcfc23481 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61be300732ca847f573bcfaec2a88c5e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd2a7f8216aafe2e68e83851ec0b1081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9314abd07086d74ea6c3c073d995b0eb
publicationDate	1998-06-30^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	US-5772862-A
titleOfInvention	Film comprising silicon dioxide as the main component and method for its productiion
abstract	The present invention relates to a film comprising silicon dioxide as the main component, which contains Zr, etc., and a method for forming it by reactive DC sputtering. It makes it possible to form reflection preventive films, alkali barrier films and various multi-layered films such as multi-layered films for anti-iridescent glass, which contain said film comprising silicon dioxide as the main component, by a physical vapor deposition method without breaking a vacuum.
isCitedBy	http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2103978-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6136678-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9110230-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10837103-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8753906-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9703011-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9366784-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11667565-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10730788-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11567237-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11698475-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11002885-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102008014900-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10995404-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012091488-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9611999-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105314886-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6495474-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007281171-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10358087-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11714213-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9079802-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009305062-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9790593-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7901781-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9684097-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6328865-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9359261-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016159282-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6207536-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1972968-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11231526-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10948629-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10444408-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9067822-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11267973-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10436945-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016018080-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9726786-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9335444-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7659002-B2
priorityDate	1988-03-03^^<http://www.w3.org/2001/XMLSchema#date>
type	http://data.epo.org/linked-data/def/patent/Publication

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