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filingDate 1996-12-19^^<http://www.w3.org/2001/XMLSchema#date>
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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c569bc44919064654236ce390778ff9
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publicationDate 1999-01-05^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-5855960-A
titleOfInvention Topcoating composition and film-forming process by use of the same
abstract The present invention relates a topcoating composition and a film-forming process by use of the topcoating composition, which are capable of forming a coated film having good weather resistance and good stain resistance. The present invention provides a topcoating composition prepared by incorporating a specified organosilicate and/or its condensate into a specified organic coating composition, a film formed from said topcoating composition being such that a surface of the film, which has been subjected to an acid treatment, shows a contact angle to water of 70 DEG or less; and a film-forming process which comprises coating said topcoating composition onto a substrate to form a film, followed by treating the surface of the film with an acid.
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