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filingDate 1996-07-17^^<http://www.w3.org/2001/XMLSchema#date>
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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3892e6b0122d2d89f38fabd75a95aba
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publicationDate 1999-02-23^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-5874010-A
titleOfInvention Pole trimming technique for high data rate thin film heads
abstract A method for trimming a pole used in a read-write head comprises the step of depositing a metallic layer on a layer of pole material, patterning the metallic layer so that it can serve as a mask, and ion beam etching the pole material with nitrogen ions. Of importance, a thin nitride layer forms on the metallic layer so that the etch rate of the metallic layer during ion beam etching is slowed. Alternatively, in lieu of the metallic layer, a nitride layer can be used.
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