Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-117 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2211-42 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-2271 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J29-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-227 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J17-49 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K11-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K11-08 |
filingDate |
2000-03-09^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2001-06-19^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b6921135895ff72eaffe4af7e50671f9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bdaf6577a88272ff3093c7660a2073b3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05048a398adfd35aa8634ba9343c3f03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c555b4775438c7f68d1989c240e895d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89eb7d0468297b57159f69f64467893c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d937ac5c11b89974d45afef3bf3df7c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4566e477ce3657aab1dde528ff23a26d |
publicationDate |
2001-06-19^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-6248501-B1 |
titleOfInvention |
Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same |
abstract |
Disclosed are a photosensitive resin composition which comprises:(C) a photopolymerizable unsaturated compound having an ethylenic unsaturated group;(D) a photopolymerization initiator which produces free radical by irradiation of active light; and(E) a surface treated phosphor,a photosensitive film and a process for preparing a fluorescent pattern using the same, and a plate for a display panel. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030048335-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1319700-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1319700-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7049036-B1 |
priorityDate |
1995-10-13^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |