| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B31-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4408
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-481 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B25-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B31-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate |
2000-08-25^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2001-07-03^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ed9dc131370954f72bfbd370d374eef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_260ebbf314e942639659e8afdb09aef6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ae0feb4a977ae48c191e60849fb20542
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15679a6cb37b60a3098911848575bbbc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a3486624d64ee253f983b48b436d68f |
| publicationDate |
2001-07-03^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6254686-B1 |
| titleOfInvention |
Vented lower liner for heating exhaust gas from a single substrate reactor |
| abstract |
The present invention is a single wafer reactor having a vented lower liner for heating exhaust gas. The apparatus of the present invention includes a reaction chamber. A wafer support member which divides the chamber into an upper and lower portion is positioned within the chamber. A gas outlet for exhausting gas from the chamber has a vent to exhaust gas from the lower portion of the chamber and an exhaust passage opening to exhaust gas from the upper portion of the chamber. Heated inert purge gas is fed from the lower chamber portion through the vent at a rate so as to prevent the deposition gas from condensing in the exhaust passage. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013162972-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I697364-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009044699-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8372202-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I455227-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101522739-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8343317-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8673395-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8673079-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9870919-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012192793-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013122718-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008220150-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8926753-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007267143-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015195256-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7648578-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10240235-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010055314-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010050943-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6455814-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007107653-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I456681-B |
| priorityDate |
1997-04-11^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |