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filingDate 1998-01-28^^<http://www.w3.org/2001/XMLSchema#date>
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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_71b4aaa9cc3b5c648af576c7c38f1785
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_579f510ab8ecdf18ad81bf79c5eec480
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publicationDate 2001-09-18^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6291619-B1
titleOfInvention Photosensitive resin composition, method for forming pattern therefrom, electronic devices produced by using the same, and method for production thereof
abstract A photosensitive composition comprising a polyimide precursor, a photosensitive material having a structure represented by the following formulawherein A1 is an atom belonging to Group VI of the periodic table, in the molecule thereof and/or a photosensitive material having a structure represented by the following formula:wherein A2 is O, S or N atom, in the molecule thereof is suitable for formation of a positive tone pattern excellent in heat resistance, and applicable to electronic devices.
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