| abstract |
A method of aligning a lithographic fabrication tool to a substrate to be exposed or patterned by the tool includes the steps of providing a first conductive coil pattern on a surface of the substrate, applying electrical current to the coil pattern, providing a second conductive coil on a surface of the tool, sensing an electro-magnetic field generated by the first coil and the second coil, and aligning the tool according to the signal sensed from the first coil. The method contemplates that electrical current is provided to the first coil from either an external source or the tool. Electrical current is provided by the tool through electrical probes on the tool that contact the first coil, preferably at contact pads. A semiconductor processing lithography apparatus for maskless pattern generation is also disclosed. The apparatus includes a membrane, a conductive coil on a surface of the membrane to sense an electro-magnetic field and generate a signal in accordance with the sensed electro-magnetic field, and a control logic unit mounted on the membrane for controlling the position of the apparatus in accordance with the signal from the conductive coil. |