http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6458426-B1

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filingDate 2000-11-22^^<http://www.w3.org/2001/XMLSchema#date>
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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_573f572cfa8a7ac3f62232b9571a9edb
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publicationDate 2002-10-01^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6458426-B1
titleOfInvention Method for depositing a patterned layer of material over a substrate
abstract This application relates to a method of depositing a patterned layer of material, such as organic material, over a substrate or organizing materials over a substrate. The method involves using a stamp having at least one conductive pathway and an insulating layer to transfer material from a solution to a substrate in a specified pattern. The stamp may be used multiple times to transfer a similar pattern of organic material to multiple substrates or to different portions of the same substrate. The transferred material may then be preferably used as a photolithographic mask for nano-patterning the substrate. This application also relates to a stamp that may be used in depositing a patterned layer of material onto a substrate, a method of forming such a stamp, and a method of depositing a layer of oriented molecules over a substrate.
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