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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
filingDate 2001-08-17^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2003-05-13^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2fc4d33a9193dd5138e2dcd5b612b596
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a49fb75afe3484f096765172bad9db07
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publicationDate 2003-05-13^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6562527-B2
titleOfInvention Imaged members and method of preparation thereof
abstract A method of manufacturing a selectively relief-treated image member that comprises:(a) providing a precursor of the image member, the precursor comprising a surface having an image-forming layer comprising a photosensitive resist composition comprising:(i) a polymerizable material, and(ii) a binder;(b) delivering radiation image-wise to the precursor;(c) developing the precursor in a developer in order to selectively remove the image-forming layer in regions to which said radiation was not delivered image-wise in step (b); and(d) contacting the image-wise exposed precursor with a relief-treatment material, in order to selectively relief-treat regions of the surface of the precursor in which the image-forming layer was removed on development in step (c).
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