Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-085 |
filingDate |
2001-05-02^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2003-08-26^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f3d05d7a0428f53337bf66e0c566791 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_242aa1336038814487b136ffa11db0d3 |
publicationDate |
2003-08-26^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-6610609-B2 |
titleOfInvention |
Compatibilization treatment |
abstract |
Disclosed are compositions and methods for improving compatibility of imaging layers with dielectric layers. Also disclosed are methods of reducing or eliminating poisoning of photoresists during electronic device manufacture. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005090605-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6987198-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003216495-A1 |
priorityDate |
2000-05-02^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |