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filingDate 2001-04-05^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2003-09-30^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f505cbc4aad6864a8cc16ac2b60a5d0
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publicationDate 2003-09-30^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6627387-B2
titleOfInvention Method of photolithography
abstract A method of photolithography. An anti-reflective coating is formed on the conductive layer. An nitrogen plasma treatment is performed. A photo-resist layer is formed and patterned on the anti-reflective coating. The conductive layer is defined. The photo-resist layer is removed. The anti-reflective layer is removed by using phosphoric acid.
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priorityDate 1998-01-26^^<http://www.w3.org/2001/XMLSchema#date>
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