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titleOfInvention pH buffered compositions useful for cleaning residue from semiconductor substrates
abstract A semi-aqueous cleaning formulation useful for removing particles from semiconductor wafer substrates formed during a dry etching process for semiconductor devices, the cleaning formulation comprising a buffering system a polar organic solvent, and a fluoride source.
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http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID226406018
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID15869812
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10690
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID226423222
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID18003851
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID33944
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID226406017

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