| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_652f07cd89fb027a4e6ea76e1912e293 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-54 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-46 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-54 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
1999-10-20^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2004-11-02^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f101414ae80ebc355092e6ea5d73ab1 |
| publicationDate |
2004-11-02^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6811931-B1 |
| titleOfInvention |
Photomask original form having layer for protecting film surface and method for preparing the same, and protective layer-forming liquid for photomask original form |
| abstract |
A photomask plate with a film surface protective layer is characterized in that a protective layer forming solution is prepared by mixing a main constituent comprising a two-liquid cross-linked antifouling surface coating agent, prepared by combining a mixed resin of a fluororesin and an acrylic resin in a solvent mixture of n-butyl acetate, methyl ethyl ketone (MEK) and methyl isobutyl ketone (MIBK), with a cross-linking curing agent, prepared by mixing a polyisocyanate prepolymer and ethyl acetate, and a diluent comprising n-butyl acetate, methyl ethyl ketone (MEK) and cellosolve (ethylene glycol monoethyl ether) acetate. This protective layer forming solution is applied to a film surface of a photomask plate photosensitive emulsion layer produced by forming the film surface of the photosensitive emulsion layer (an emulsion photomask) on a substrate. The protective layer forming solution is then aged to form a film surface protective layer in a laminated manner. The resulting inexpensive and durable photomask is protected from being soiled or marked while having minimal reduction in ultraviolet light transmittance. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011027702-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8663874-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8420281-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8748060-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9096712-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011008733-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10584264-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9051423-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103019028-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103019028-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8563221-B2 |
| priorityDate |
1999-10-20^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |