patent/US-6828241-B2

http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6828241-B2

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filingDate	2002-01-07^^<http://www.w3.org/2001/XMLSchema#date>
grantDate	2004-12-07^^<http://www.w3.org/2001/XMLSchema#date>
inventor	http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_348ce0f8400fd4b0cd576ae962b7825e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73e0df3866a4e1e418202d22b111fd8b
publicationDate	2004-12-07^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	US-6828241-B2
titleOfInvention	Efficient cleaning by secondary in-situ activation of etch precursor from remote plasma source
abstract	An electro-negative cleaning or etchant gas, such as fluorine, that was ionized from a stable supply gas such as NH3 in a secondary chamber and recombined in the primary chamber, is re-ionized within the primary chamber by electron attachment by ionizing an electron donor gas, such as helium, in the primary chamber.
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