http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6842657-B1

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filingDate 2000-07-21^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2005-01-11^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75516338697bca755343439e3ccda628
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publicationDate 2005-01-11^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6842657-B1
titleOfInvention Reactive formation of dielectric layers and protection of organic layers in organic semiconductor device fabrication
abstract In one embodiment of the invention, a method of manufacturing a semiconductor device comprises the steps of: a) providing an organic semiconductor layer; b) depositing a reactive species on a portion of the organic semiconductor layer; and c) reacting the reactive species with the portion of the organic layer to form a dielectric layer.
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