| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S134-902 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-102
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-10 |
| filingDate |
2002-10-16^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2005-12-13^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65a82c68aad1cc7033906f6b424c1efa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e571a5cfb756c39781a537dc46bd3e2c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cbe509be97bfe5292889155923311ee7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91eb138d90ffbd4947199f0b66e94fef |
| publicationDate |
2005-12-13^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6974505-B2 |
| titleOfInvention |
Tool for cleaning substrates |
| abstract |
A cleaning tool for cleaning substrates, comprising a circulation conduit through which is circulated a cleaning liquid or gas. The circulation conduit is disposed in fluid communication with an upstream flow chamber and a downstream cleaning chamber, the cross-sectional area of which cleaning chamber is less than the cross-sectional area of the flow chamber. In use, the cleaning chamber receives a wafer substrate for cleaning of particles or removal of polymer films from the substrate. The smaller cross-sectional area of the cleaning chamber accelerates the flow of a cleaning fluid flowing through the cleaning chamber from the flow chamber. The rapidly-flowing cleaning fluid removes the particles and/or films from the substrate while preventing dropping of the removed particles or re-deposition of the film back onto the substrate. A particle filter may be provided in the circulation conduit downstream of the cleaning chamber for removing the particles. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009272461-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8075704-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006118138-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007137676-A1 |
| priorityDate |
2002-10-16^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |