Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c5520dd38cc403678d9f91e0b0ee95fb |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03G5-10 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G5-05 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G5-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G21-00 |
filingDate |
2003-07-28^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2006-07-18^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03d89e796a6b2be6690bb4fd9321cb81 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e311bfe6d8e76461bac4d46bdf836ad http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_013ef8d0ec35cfd1bad62c52486ab393 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bbade766d3cca9a2ed1781e9f4f27228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e633c7e068c3463ae088f2b1cad95497 |
publicationDate |
2006-07-18^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7078143-B2 |
titleOfInvention |
Electrophotographic photoreceptor and method for producing the same |
abstract |
The object of the invention is to prevent interference fringes of images and allow precise measurement of the thickness of a layer by the optical interferometry by limiting the surface roughness of a conductive substrate. The surface roughness of the conductive substrate provided in an electrophotographic photoreceptor is such that the maximum peak-to-valley roughness height (Ry)=0.8 to 1.4 μm, the centerline average roughness (Ra)=0.10 to 0.15 μm, the ten-point average roughness (Rz)=0.7 to 1.3 μm, the average peak-to-peak distance (Sm)=5 to 30 μm, and the peak count Pc=60 to 100. In such an electrophotographic photoreceptor, light for exposure can be scattered to an appropriate extent, so that interference fringes can be prevented, and an interference pattern is formed during measurement of the thickness of the photosensitive layer by the optical interferometry so that the thickness of the layer can be measured with a high precision. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009092421-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7546075-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010230473-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006159494-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008181664-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8164909-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8068772-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7558508-B2 |
priorityDate |
2002-09-13^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |