http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7089665-B2

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filingDate 2004-06-15^^<http://www.w3.org/2001/XMLSchema#date>
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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18331a832e682f8f2f3f807eef3dfbc7
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publicationDate 2006-08-15^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7089665-B2
titleOfInvention Method for fabricating a monolithic fluid injection device
abstract A method for fabricating a monolithic fluid injection device. The method includes providing a substrate with a patterned sacrificial layer thereon. Next, a patterned support layer and a patterned resistive layer, as a heating element, are formed on the substrate sequentially. A patterned insulating layer having a heating element contact via and a first opening is formed on the support layer. A patterned conductive layer is formed on the support layer and fills the heating element contact via as a signal transmitting circuit. A patterned protective layer having a signal transmitting circuit contact via and a second opening corresponding to the first opening is formed on the substrate. A manifold is formed by wet etching the back of the substrate to expose the sacrificial layer. A chamber is formed by removing the sacrificial layer in the wet etching process. Finally, an opening connecting the chamber is formed by etching the support layer along the second opening.
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