http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7220475-B2

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filingDate 2003-08-18^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2007-05-22^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_39d77cd861f895cdba9aad3c1ff26944
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publicationDate 2007-05-22^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7220475-B2
titleOfInvention Polishing sheet and polishing work method
abstract The present invention provides a polishing sheet that can secure a flatness of a material to be polished and can improve a polishing efficiency. A polishing pad 1 has a polyurethane sheet 2 made of polyurethane resin. The polyurethane sheet 2 has large cells 3 with a generally triangular sectional configuration rounded along a thickness direction thereof. Polyurethane resin exists in the polyurethane sheet 2 in a partition wall manner and fine foams 4 are formed in the polyurethane resin. Fine particles 5 added during manufacture of the polyurethane sheet 2 exist inside some of the fine foams 4 and the fine particles 5 are separable from the fine foams. By separating off fine particles positioned at a polishing face P by dummy polishing or the like, fine foams which evenly reserve a polishing liquid containing abrasive particles are formed at the polishing face P.
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priorityDate 2003-06-03^^<http://www.w3.org/2001/XMLSchema#date>
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